Advanced Metallization for Future Ulsi: Symposium Held...

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Advanced Metallization for Future Ulsi: Symposium Held April 8-11, 1996, San Francisco, California, U.S.A.

K. N. Tu, James W. Mayer, J. M. Poate, Lih J. Chen

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როგორ მოგეწონათ ეს წიგნი?

როგორი ხარისხისაა ეს ფაილი?

ჩატვირთეთ, ხარისხის შესაფასებლად

როგორი ხარისხისაა ჩატვირთული ფაილი?

კატეგორია:

წელი:

1996

გამომცემლობა:

Materials Research Society

ენა:

english

გვერდები:

587

ISBN 10:

1558993304

ISBN 13:

9781558993303

სერია:

Materials Research Society Symposium Proceedings

ფაილი:

DJVU, 7.25 MB

IPFS:

,

english, 1996

ონლაინ წაკითხვა

ჩატვირთვა (djvu, 7.25 MB)

ხორციელდება კონვერტაციის -ში

კონვერტაციის -ში ვერ მოხერხდა

შესაძლოა დაგაინტერესოთ

John M. Andrews and George K. Celler (Editors) — ULSI Science and Technology 1991

T. S. Cale, F. S. Pintchovski — Advanced Metallization for Ulsi Applications

Yale Strausser — Characterization of Silicon Processing (Materials Characterization)

Ehrenfried Zschech (Editor), Caroline Whelan (Editor), Thomas Mikolajick (Editor) — Materials for Information Technology: Devices, Interconnects and Packaging (Engineering Materials and Processes)

Lih J. Chen — Silicide Technology for Integrated Circuits (Processing)

C. Y. Chang, S. M. Sze — Ulsi Technology

Tapan Gupta (auth.) — Copper Interconnect Technology

Strausser, Yale — Characterization in Silicon Processing

H. Fukuda — Rapid Thermal Processing for Future Semiconductor Devices

Henry Radamson — CMOS Past, Present and Future (Woodhead Publishing Series in Electronic and Optical Materials)

Luo, Jun; Radamson, Henry; Simoen, Eddy; Zhao, Chao — CMOS Past, Present and Future.

Norman G. Einspruch, Simon S. Cohen, Gennady Sh Sildenblat — Vlsi Metallization

Richard B. Fair (Eds.) — Rapid Thermal Processing. Science and Technology

Shyam P. Murarka (Auth.) — Silicides for Vlsi Applications

Ohring M. — Materials science of thin films

Krishna Seshan，Dominic Schepis — Handbook of Thin Film Deposition (Fourth Edition)

Y. Shacham-Diamand (auth.), Yosi Shacham-Diamand, Tetsuya Osaka, Madhav Datta, Takayuki Ohba (eds.) — Advanced Nanoscale ULSI Interconnects: Fundamentals and Applications

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C.E. Morosanu and G. Siddall (Auth.) — Thin Films by Chemical Vapour Deposition

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Klaus K Schuegraf; Krishna Seshan — Handbook of Thin Film Deposition Processes and Techniques : Principles, Methods, Equipment and Applications

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Administrator — Silicon Processing for the VLSI Era, Vol. 2: Process Integration

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R. C. Ellwanger, S. Q. Wang — Advanced Metallization and Interconnect Systems for Ulsi Applications in 1995

Robert Havemann, J. Schmitz, H. Komiyama, K. Tsubouchi, Berkeley Continuing Education in engineering University of California — Advanced Metallization & Interconnect Systems for Ulsi Applications in 1996: Materials Research Society Conference Proceedings

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